Harry J. Levinson: Harry did his undergraduate work at Cornell University, and began his Ph.D research in the area of gas phase photoionization cross-section measurements. His thesis work evolved into a general study of "Resonances and Collective Effects in Photoemission" with his Ph.D granted in 1980. Two of the most cited papers resulting from Harry's thesis work are:

  • "The Effects on Photoemission of the Spatially Varying Photon Field at a Metal Surface, H.J. Levinson, E.W. Plummer and P.J. Feibelman, Phys. Rev. Lett. 43, 952 (1979).


  • "Experimental Band Structure of Aluminum, H.J. Levinson, F. Greuter and E.W. Plummer, Phys. Rev. B 27, 727 (1983).

His thesis work was acknowledged at the APS Physical Electronics Meeting in 1980 where he was awarded the Nottingham Prize for the best thesis presentation titled, "Effect of Dielectric Response on surface Photoemission." Harry did a postdoctoral fellowship at the University of California at Berkeley and then went to work in industry. He is currently at Strategic Lithography Technology, where he is an Advanced Micro Devices (AMD) Fellow and manager of AMD's Strategic Lithography Technology Department. Harry started his career in Bipolar Memory Development at AMD, then spent some time at Sierra Semiconductor and IBM before returning to AMD in 1994. During the course of his career, Harry has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of applications-specific integrated circuits, thin film heads for magnetic recording, and advanced logic. He was one of the first users of 5x steppers in Silicon Valley and was an early participant in 248 nm and 193 nm lithography. He has published numerous articles on lithography science and is the author of two books, Lithography Process Control and Principles of Lithography.

 

Levinson

Harry's first love at PENN was Rugby.
Levinson

Later in life Harry's tastes became more refined
as this picture in Tokyo reveals. Same smile!

 

 

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